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Temp range -45℃~90℃ Temp accuracy ±0.1℃
Multi channel chillers Video
Modell | FLTZ-203W-2T | |
Pipeline | channel 1 | channel 2 |
Temperaturbereich | -20℃~+90℃ | -20℃~+90℃ |
Kühlleistung | ±0.1℃(Customizable temperature control accuracy of ±0.01°C.) | |
Heizleistung | 4kW@-10℃ | 4kW@-10℃ |
Durchflussmenge des wärmeleitenden Mediums | 2kW | 2kW |
Heat conducting medium connection size | 20L/min 0.5MPa | 20L/min 0.5MPa |
Heat transfer interface | ZG3/4 | ZG3/4 |
Temperatur in der Umgebung | 10~35℃ | 10~35℃ |
Luftfeuchtigkeit der Umgebung | 30~70% | 30~70% |
Temperatur des Kühlwassers | 15~20℃ | 15~20℃ |
Cooling water flow rate | 20L/min | 20L/min |
Gewicht | 400kg | |
Abmessung cm | 50*90*160 |
Modell | FLTZ-406W/ETCU-015W | |
Pipeline | channel 1 | channel 2 |
Temperaturbereich | -45℃~+40℃ | +10℃~+80℃ |
Kühlleistung | ±0.1℃(Customizable temperature control accuracy of ±0.01°C.) | |
Heizleistung | 11kW@-20℃ 5kW@-40℃ |
13kW@+10℃ |
Durchflussmenge des wärmeleitenden Mediums | 2kW | 6kW |
Heat conducting medium connection size | 17L/min 0.7MPa | 17L/min 0.7MPa |
Heat transfer interface | ZG3/4 | ZG3/4 |
Temperatur in der Umgebung | 10~35℃ | 10~35℃ |
Luftfeuchtigkeit der Umgebung | 30~70% | 30~70% |
Temperatur des Kühlwassers | 15~20℃ | 15~20℃ |
Cooling water flow rate | 40L/min | 20L/min |
Gewicht | 550kg | |
Abmessung cm | 60*100*185 |
Modell | FLTZ-203W/2T Doppelsystem | FLTZ-305W/2T Doppelsystem | FLTZ-406W/2T Doppelsystem | |||
Temperaturbereich | -20℃~90℃ | -30℃~90℃ | -45℃~90℃ | |||
Genauigkeit der Temperaturregelung | ±0.1℃(Customizable temperature control accuracy of ±0.01°C.) | |||||
Durchflussmenge des wärmeleitenden Mediums | 15~45l/min 6bar max | |||||
Heizleistung | 2,5 kW | 2,5 kW | 2,5 kW | 2,5 kW | 3,5 kW | 3,5 kW |
Kühlleistung | 3kW @-15℃ | 3kW @-15℃ | 5kW @-15℃ | 5kW @-15℃ | 2.5kW @ -35℃ | 2.5kW @ -35℃ |
Volumen der internen Zirkulationsflüssigkeit | 5L | 5L | 8L | 8L | 8L | 8L |
Schnittstelle zum Kühlwasser | 50L/min bei20℃ | 600L/min bei20℃ | 50L/min bei20℃ |
Modell | FLTZ-203W/ETCU-008W | ||
Pipeline | channel 1 | channel 2 | channel 3 |
Temperaturbereich | -10℃~+60℃ | +30℃~+80℃ | -10℃~+80℃ |
Temperature stability | ±0.1℃(Customizable temperature control accuracy of ±0.01°C.) | ||
Kühlleistung | 4kW@-10℃/21kW@+20℃ | 6 kW@+30℃ | 3kW@-10℃ |
Heizleistung | 4kW | 4.5+6kW | 3kW |
Durchflussmenge des wärmeleitenden Mediums | 17L/min 0.7MPa | 17L/min 0.7MPa | 17L/min 0.7MPa |
Heat conducting medium connection size | ZG3/4 | ZG3/4 | ZG3/4 |
Temperatur in der Umgebung | 10~35 ℃ | 10~35 ℃ | 10~35 ℃ |
Luftfeuchtigkeit der Umgebung | 30~70% | 30~70% | 30~70% |
Cooling water flow rate | 15~20℃ | 15~20℃ | 15~20℃ |
Temperatur des Kühlwassers | 30L/min@15~20℃ | 15L/min@15~20℃ | 15L/min@15~20℃ |
Stromkreisunterbrecher | 100A | ||
Gewicht | 600kg | ||
Abmessung cm | 60*100*170 |
Modell | FLT-215W/ETCU-015W/ETCU-008W | ||
Pipeline | channel 1 | channel 2 | channel 3 |
Temperaturbereich | -20℃~+50℃ | +30℃~+100℃ | +30℃~+40℃ |
Temperature stability | ±0.1℃(Customizable temperature control accuracy of ±0.01°C.) | ||
Kühlleistung | 15kW@-10℃ | 13kW@PCW+15℃ | 8kW@PCW+10℃ |
Heizleistung | 2kW | 6kW | Wärmeverlust der Pumpe |
Durchflussmenge des wärmeleitenden Mediums | 30L/min 0.85MPa | 30L/min 0.85MPa | 20L/min 0.8MPa |
Heat conducting medium connection size | ZG3/4 | ZG3/4 | ZG3/4 |
Temperatur in der Umgebung | 10~35 ℃ | 10~35 ℃ | 10~35 ℃ |
Luftfeuchtigkeit der Umgebung | 30~70% | 30~70% | 30~70% |
Cooling water flow rate | 15~20℃ | 15~20℃ | 15~20℃ |
Temperatur des Kühlwassers | 30L/min@15~20℃ | 15L/min@15~20℃ | 15L/min@15~20℃ |
Stromkreisunterbrecher | 75A | ||
Gewicht | 600kg | ||
Abmessung cm | 60*100*170 |
Multi-channel Chiller‘s Applications
FLTZ multi-channel chillers are widely used in the semiconductor industry due to their advantages such as precise temperature control, independent circuit management, and rapid cooling. The application scenarios of semiconductor chillers include wafer manufacturing, packaging testing, photolithography, etching, CVD/PVD deposition, cleaning processes, etc.
The high-energy particle beam generated during ion implantation can cause local high temperatures. The process chiller can quickly remove heat to prevent thermal damage to the wafer.
During plasma etching (RIE, ICP, etc.), the chamber and electrodes need to be strictly temperature controlled to ensure etching uniformity. The chiller can provide a stable temperature environment for etching equipment and reduce process deviations
In the packaging process of BGA, CSP, FCBGA, etc., the temperature control of welding and packaging materials affects reliability
CVD (such as LPCVD, PECVD) and PVD (such as sputtering coating) are used for thin film deposition, and the temperature control of the chamber and substrate affects the quality of the film.
The exposure system, optical lenses, laser light sources, and mask plates of the photolithography machine require precise temperature control to ensure pattern accuracy.
Used to help maintain deionized water within a specific temperature range to remove photoresist residues, metal contamination and particulate matter.
Why do you need FLTZ multi channel chillers?
Why Choose LNEYA®?
If LNEYA® multi channel chillers do not meet your application
we can tailor a suitable solution for you.
Kontakt LNEYA®
Schicken Sie uns Ihre Anfrage und wir werden Sie innerhalb von 24 Stunden kontaktieren.
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18914253067
86 13912479193
E-Mail Adresse
sales@cnzlj.com